Open-source Multiple Patterning Layout Decomposition
Published:
We present OpenMPL, an open-source multiple patterning layout decomposition framework for advanced multiple patterning lithography.
- OpenMPL Features
- Contact or metal layer decomposition
- Stitching
- Support 3 or 4 coloring
- Density control
- Multi-threading
- Small memory usage
- Multiple algorithms: ILP (Gurobi or Lemon CBC), SDP (Csdp API), LP (Gurobi API), Dancing Links