Open-source Multiple Patterning Layout Decomposition

Published:

We present OpenMPL, an open-source multiple patterning layout decomposition framework for advanced multiple patterning lithography.

  • OpenMPL Features
    • Contact or metal layer decomposition
    • Stitching
    • Support 3 or 4 coloring
    • Density control
    • Multi-threading
    • Small memory usage
    • Multiple algorithms: ILP (Gurobi or Lemon CBC), SDP (Csdp API), LP (Gurobi API), Dancing Links